Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation

A photo-crosslinked polystyrene (PS) thin film is investigated as a potential guiding sub-layer for polystyrene-block-poly (methyl methacrylate) block copolymer (BCP) cylindrical nanopattern formation via topographic directed self-assembly (DSA). When compared to a non-crosslinked PS brush sub-layer...

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Detalles Bibliográficos
Autores principales: Koh, Haeng-Deog, Kim, Mi-Jeong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5509098/
https://www.ncbi.nlm.nih.gov/pubmed/28773768
http://dx.doi.org/10.3390/ma9080648

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5509098/
https://www.ncbi.nlm.nih.gov/pubmed/28773768
http://dx.doi.org/10.3390/ma9080648

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