Influence of N(2) Partial Pressure on Structure and Mechanical Properties of TiAlN/Al(2)O(3) Multilayers

TiAlN/Al(2)O(3 )multilayers with different Ar/N(2) ratios were deposited on Sisubstrates in different N(2) partial pressure by magnetron sputtering. The crystalline and multilayer structures of the multilayers were determined by a glancing angle X-ray diffractometer (XRD). A nanoindenter was used to...

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Detalles Bibliográficos
Autores principales: Yan, Jingyue, Dong, Lei, Gao, Chongkuan, Wang, Ning, Li, Dejun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2013
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5512799/
https://www.ncbi.nlm.nih.gov/pubmed/28809340
http://dx.doi.org/10.3390/ma6030795

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5512799/
https://www.ncbi.nlm.nih.gov/pubmed/28809340
http://dx.doi.org/10.3390/ma6030795

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