Influence of N(2) Partial Pressure on Structure and Mechanical Properties of TiAlN/Al(2)O(3) Multilayers

TiAlN/Al(2)O(3 )multilayers with different Ar/N(2) ratios were deposited on Sisubstrates in different N(2) partial pressure by magnetron sputtering. The crystalline and multilayer structures of the multilayers were determined by a glancing angle X-ray diffractometer (XRD). A nanoindenter was used to evaluate the hardness, the elastic modulus and scratch scan of the multilayers. The chemical bonding was investigated by a X-ray Photoelectron Spectroscopy (XPS). The maximum hardness (36.3 GPa) and elastic modulus (466 GPa) of the multilayers was obtained when Ar/N(2) ratio was 18:1. The TiAlN/Al(2)O(3) multilayers were crystallized with orientation in the (111) and (311) crystallographic planes. The multilayers displayed stably plastic recovery in different Ar/N(2) ratios. The scratch scan and post scan surface profiles of TiAlN/Al(2)O(3) multilayers showed the highest critical fracture load (L(c)) of 53 mN for the multilayer of Ar/N(2) = 18:1. It indicated that the multilayer had better practical adhesion strength and fracture resistance.