Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)

Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. Th...

Descripción completa

Detalles Bibliográficos
Autores principales: Kuschel, Olga, Dieck, Florian, Wilkens, Henrik, Gevers, Sebastian, Rodewald, Jari, Otte, Christian, Zoellner, Marvin Hartwig, Niu, Gang, Schroeder, Thomas, Wollschläger, Joachim
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5512919/
https://www.ncbi.nlm.nih.gov/pubmed/28793569
http://dx.doi.org/10.3390/ma8095312

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5512919/
https://www.ncbi.nlm.nih.gov/pubmed/28793569
http://dx.doi.org/10.3390/ma8095312

Ejemplares similares