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Effect of the SiCl(4) Flow Rate on SiBN Deposition Kinetics in SiCl(4)-BCl(3)-NH(3)-H(2)-Ar Environment

To improve the thermal and mechanical stability of SiC(f)/SiC or C/SiC composites with SiBN interphase, SiBN coating was deposited by low pressure chemical vapor deposition (LPCVD) using SiCl(4)-BCl(3)-NH(3)-H(2)-Ar gas system. The effect of the SiCl(4) flow rate on deposition kinetics was investiga...

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Detalles Bibliográficos
Autores principales: Li, Jianping, Qin, Hailong, Liu, Yongsheng, Ye, Fang, Li, Zan, Cheng, Laifei, Zhang, Litong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5553535/
https://www.ncbi.nlm.nih.gov/pubmed/28772986
http://dx.doi.org/10.3390/ma10060627