Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer

A micropyramid structure was formed on the surface of a monocrystalline silicon wafer (100) using a wet chemical anisotropic etching technique. The main objective was to evaluate the performance of the etchant based on the silicon surface reflectance. Different isopropyl alcohol (IPA) volume concent...

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Detalles Bibliográficos
Autores principales: Abdur-Rahman, Eyad, Alghoraibi, Ibrahim, Alkurdi, Hassan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Hindawi 2017
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5554996/
https://www.ncbi.nlm.nih.gov/pubmed/28831284
http://dx.doi.org/10.1155/2017/7542870

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5554996/
https://www.ncbi.nlm.nih.gov/pubmed/28831284
http://dx.doi.org/10.1155/2017/7542870

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