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Investigations of Phase Transformation in Monocrystalline Silicon at Low Temperatures via Nanoindentation
Nanoindentations of monocrystalline silicon are conducted to investigate the phase transformation process at a temperature range from 292 K to 210 K. The load-displacement curves are obtained and the residual indents are detected by Raman spectra. MD simulations are also conducted to identify the ph...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2017
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5561054/ https://www.ncbi.nlm.nih.gov/pubmed/28819254 http://dx.doi.org/10.1038/s41598-017-09411-x |