Charge Splitting In Situ Recorder (CSIR) for Real-Time Examination of Plasma Charging Effect in FinFET BEOL Processes

A novel device for monitoring plasma-induced damage in the back-end-of-line (BEOL) process with charge splitting capability is first-time proposed and demonstrated. This novel charge splitting in situ recorder (CSIR) can independently trace the amount and polarity of plasma charging effects during t...

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Detalles Bibliográficos
Autores principales: Tsai, Yi-Pei, Hsieh, Ting-Huan, Lin, Chrong Jung, King, Ya-Chin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5603469/
https://www.ncbi.nlm.nih.gov/pubmed/28924695
http://dx.doi.org/10.1186/s11671-017-2309-0

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5603469/
https://www.ncbi.nlm.nih.gov/pubmed/28924695
http://dx.doi.org/10.1186/s11671-017-2309-0

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