Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition

A novel supercycled atomic layer deposition (ALD) process which combines thermal ALD process with in situ O(2) plasma treatment is presented in this work to deposit ZnO thin films with highly tunable electrical properties. Both O(2) plasma time and the number of thermal ALD cycles in a supercycle ca...

Descripción completa

Detalles Bibliográficos
Autores principales: Huang, Ruomeng, Ye, Sheng, Sun, Kai, Kiang, Kian S., de Groot, C. H. (Kees)
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5605484/
https://www.ncbi.nlm.nih.gov/pubmed/28929410
http://dx.doi.org/10.1186/s11671-017-2308-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5605484/
https://www.ncbi.nlm.nih.gov/pubmed/28929410
http://dx.doi.org/10.1186/s11671-017-2308-1

Ejemplares similares