Cargando…
Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
A novel supercycled atomic layer deposition (ALD) process which combines thermal ALD process with in situ O(2) plasma treatment is presented in this work to deposit ZnO thin films with highly tunable electrical properties. Both O(2) plasma time and the number of thermal ALD cycles in a supercycle ca...
Autores principales: | Huang, Ruomeng, Ye, Sheng, Sun, Kai, Kiang, Kian S., de Groot, C. H. (Kees) |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2017
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5605484/ https://www.ncbi.nlm.nih.gov/pubmed/28929410 http://dx.doi.org/10.1186/s11671-017-2308-1 |
Ejemplares similares
-
Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016) -
Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition
por: Wang, Aiji, et al.
Publicado: (2015) -
Photocurrent detection of chemically tuned hierarchical ZnO nanostructures grown on seed layers formed by atomic layer deposition
por: Bang, Seokhwan, et al.
Publicado: (2012) -
Bi-layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
por: Li, Huijin, et al.
Publicado: (2017) -
Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition
por: Ye, Zhi-Yuan, et al.
Publicado: (2013)