Preparation of Humidity-Sensitive Poly(Ethylene Glycol) Inverse Opal Micropatterns Using Colloidal Lithography

Humidity-sensitive poly(ethylene glycol) (PEG) inverse opals with micropatterns of 2 μm wide anti-swell-broken grooves were prepared using polystyrene (PS) colloidal crystals as templates and colloidal lithography. Monodisperse PS colloids were deposited in an ordered manner onto glass slides using...

Descripción completa

Detalles Bibliográficos
Autores principales: Yu, Bing, Cong, Hailin, Yang, Zhen, Yang, Shujing, Wang, Yuezhong, Zhai, Feng, Wang, Yifan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5615690/
https://www.ncbi.nlm.nih.gov/pubmed/28872619
http://dx.doi.org/10.3390/ma10091035

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5615690/
https://www.ncbi.nlm.nih.gov/pubmed/28872619
http://dx.doi.org/10.3390/ma10091035

Ejemplares similares