Morphological Evolution of Pit-Patterned Si(001) Substrates Driven by Surface-Energy Reduction

Lateral ordering of heteroepitaxial islands can be conveniently achieved by suitable pit-patterning of the substrate prior to deposition. Controlling shape, orientation, and size of the pits is not trivial as, being metastable, they can significantly evolve during deposition/annealing. In this paper...

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Detalles Bibliográficos
Autores principales: Salvalaglio, Marco, Backofen, Rainer, Voigt, Axel, Montalenti, Francesco
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5622022/
https://www.ncbi.nlm.nih.gov/pubmed/28963645
http://dx.doi.org/10.1186/s11671-017-2320-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5622022/
https://www.ncbi.nlm.nih.gov/pubmed/28963645
http://dx.doi.org/10.1186/s11671-017-2320-5

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