Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the...

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Detalles Bibliográficos
Autores principales: Evangelio, Laura, Gramazio, Federico, Lorenzoni, Matteo, Gorgoi, Michaela, Espinosa, Francisco Miguel, García, Ricardo, Pérez-Murano, Francesc, Fraxedas, Jordi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2017
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5629386/
https://www.ncbi.nlm.nih.gov/pubmed/29046845
http://dx.doi.org/10.3762/bjnano.8.198

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5629386/
https://www.ncbi.nlm.nih.gov/pubmed/29046845
http://dx.doi.org/10.3762/bjnano.8.198

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