Advanced Silicon-on-Insulator: Crystalline Silicon on Atomic Layer Deposited Beryllium Oxide

Silicon-on-insulator (SOI) technology improves the performance of devices by reducing parasitic capacitance. Devices based on SOI or silicon-on-sapphire technology are primarily used in high-performance radio frequency (RF) and radiation sensitive applications as well as for reducing the short chann...

Descripción completa

Detalles Bibliográficos
Autores principales: Min Lee, Seung, Hwan Yum, Jung, Larsen, Eric S., Chul Lee, Woo, Keun Kim, Seong, Bielawski, Christopher W., Oh, Jungwoo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5643296/
https://www.ncbi.nlm.nih.gov/pubmed/29038543
http://dx.doi.org/10.1038/s41598-017-13693-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5643296/
https://www.ncbi.nlm.nih.gov/pubmed/29038543
http://dx.doi.org/10.1038/s41598-017-13693-6

Ejemplares similares