Chemical and kinetic insights into the Thermal Decomposition of an Oxide Layer on Si(111) from Millisecond Photoelectron Spectroscopy

Despite thermal silicon oxide desorption is a basic operation in semiconductor nanotechnology, its detailed chemical analysis has not been yet realized via time-resolved photoemission. Using an advanced acquisition system and synchrotron radiation, heating schedules with velocities as high as 100 K....

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Detalles Bibliográficos
Autores principales: Gallet, J.-J., Silly, M. G., Kazzi, M. El, Bournel, F., Sirotti, F., Rochet, F.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5660199/
https://www.ncbi.nlm.nih.gov/pubmed/29079787
http://dx.doi.org/10.1038/s41598-017-14532-4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5660199/
https://www.ncbi.nlm.nih.gov/pubmed/29079787
http://dx.doi.org/10.1038/s41598-017-14532-4

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