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Chemical and kinetic insights into the Thermal Decomposition of an Oxide Layer on Si(111) from Millisecond Photoelectron Spectroscopy
Despite thermal silicon oxide desorption is a basic operation in semiconductor nanotechnology, its detailed chemical analysis has not been yet realized via time-resolved photoemission. Using an advanced acquisition system and synchrotron radiation, heating schedules with velocities as high as 100 K....
Autores principales: | Gallet, J.-J., Silly, M. G., Kazzi, M. El, Bournel, F., Sirotti, F., Rochet, F. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5660199/ https://www.ncbi.nlm.nih.gov/pubmed/29079787 http://dx.doi.org/10.1038/s41598-017-14532-4 |
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