Area-Selective Atomic Layer Deposition of SiO(2) Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

[Image: see text] Area-selective atomic layer deposition (ALD) is rapidly gaining interest because of its potential application in self-aligned fabrication schemes for next-generation nanoelectronics. Here, we introduce an approach for area-selective ALD that relies on the use of chemoselective inhi...

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Detalles Bibliográficos
Autores principales: Mameli, Alfredo, Merkx, Marc J. M., Karasulu, Bora, Roozeboom, Fred, Kessels, Wilhelmus (Erwin) M. M., Mackus, Adriaan J. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5665545/
https://www.ncbi.nlm.nih.gov/pubmed/28850774
http://dx.doi.org/10.1021/acsnano.7b04701

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5665545/
https://www.ncbi.nlm.nih.gov/pubmed/28850774
http://dx.doi.org/10.1021/acsnano.7b04701

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