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Area-Selective Atomic Layer Deposition of SiO(2) Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle

[Image: see text] Area-selective atomic layer deposition (ALD) is rapidly gaining interest because of its potential application in self-aligned fabrication schemes for next-generation nanoelectronics. Here, we introduce an approach for area-selective ALD that relies on the use of chemoselective inhi...

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Detalles Bibliográficos
Autores principales:	Mameli, Alfredo, Merkx, Marc J. M., Karasulu, Bora, Roozeboom, Fred, Kessels, Wilhelmus (Erwin) M. M., Mackus, Adriaan J. M.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	American Chemical Society 2017
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5665545/ https://www.ncbi.nlm.nih.gov/pubmed/28850774 http://dx.doi.org/10.1021/acsnano.7b04701

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