Ultra-Broadband, Lithography-Free, and Large-Scale Compatible Perfect Absorbers: The Optimum Choice of Metal layers in Metal-Insulator Multilayer Stacks

We report ultra-broadband perfect absorbers for visible and near-infrared applications that are based on multilayers of metal-insulator (MI) stacks fabricated employing straightforward layer deposition techniques and are, therefore, lithography-free and large-scale compatible. We scrutinize the impa...

Descripción completa

Detalles Bibliográficos
Autores principales: Abedini Dereshgi, Sina, Ghobadi, Amir, Hajian, Hodjat, Butun, Bayram, Ozbay, Ekmel
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5665894/
https://www.ncbi.nlm.nih.gov/pubmed/29093519
http://dx.doi.org/10.1038/s41598-017-13837-8

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5665894/
https://www.ncbi.nlm.nih.gov/pubmed/29093519
http://dx.doi.org/10.1038/s41598-017-13837-8

Ejemplares similares