The influence of structural disorder and phonon on metal-to-insulator transition of VO(2)

We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the therma...

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Detalles Bibliográficos
Autores principales: Hwang, In-Hui, Jin, Zhenlan, Park, Chang-In, Han, Sang-Wook
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666023/
https://www.ncbi.nlm.nih.gov/pubmed/29093503
http://dx.doi.org/10.1038/s41598-017-14235-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666023/
https://www.ncbi.nlm.nih.gov/pubmed/29093503
http://dx.doi.org/10.1038/s41598-017-14235-w

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