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The influence of structural disorder and phonon on metal-to-insulator transition of VO(2)

We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the therma...

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Detalles Bibliográficos
Autores principales: Hwang, In-Hui, Jin, Zhenlan, Park, Chang-In, Han, Sang-Wook
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666023/
https://www.ncbi.nlm.nih.gov/pubmed/29093503
http://dx.doi.org/10.1038/s41598-017-14235-w
Descripción
Sumario:We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the thermally-driven structural transition occurred prior to the resistance transition during a heating, while  this change simultaneously occured during a cooling. Extended-XAFS (EXAFS) analysis revealed significant increases of the Debye-Waller factors of the V-O and V-V pairs in the {111} direction of the R-phase VO(2) that are due to the phonons of the V-V arrays along the same direction in a metallic phase. The existance of a substantial amount of structural disorder on the V-V pairs along the c-axis in both M(1) and R phases indicates the structural instability of V-V arrays in the axis. The anomalous structural disorder that was observed on all atomic sites at the structural phase transition prevents the migration of the V 3d(1) electrons, resulting in a Mott insulator in the M(2)-phase VO(2).