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The influence of structural disorder and phonon on metal-to-insulator transition of VO(2)
We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the therma...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666023/ https://www.ncbi.nlm.nih.gov/pubmed/29093503 http://dx.doi.org/10.1038/s41598-017-14235-w |
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author | Hwang, In-Hui Jin, Zhenlan Park, Chang-In Han, Sang-Wook |
author_facet | Hwang, In-Hui Jin, Zhenlan Park, Chang-In Han, Sang-Wook |
author_sort | Hwang, In-Hui |
collection | PubMed |
description | We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the thermally-driven structural transition occurred prior to the resistance transition during a heating, while this change simultaneously occured during a cooling. Extended-XAFS (EXAFS) analysis revealed significant increases of the Debye-Waller factors of the V-O and V-V pairs in the {111} direction of the R-phase VO(2) that are due to the phonons of the V-V arrays along the same direction in a metallic phase. The existance of a substantial amount of structural disorder on the V-V pairs along the c-axis in both M(1) and R phases indicates the structural instability of V-V arrays in the axis. The anomalous structural disorder that was observed on all atomic sites at the structural phase transition prevents the migration of the V 3d(1) electrons, resulting in a Mott insulator in the M(2)-phase VO(2). |
format | Online Article Text |
id | pubmed-5666023 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-56660232017-11-08 The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) Hwang, In-Hui Jin, Zhenlan Park, Chang-In Han, Sang-Wook Sci Rep Article We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the thermally-driven structural transition occurred prior to the resistance transition during a heating, while this change simultaneously occured during a cooling. Extended-XAFS (EXAFS) analysis revealed significant increases of the Debye-Waller factors of the V-O and V-V pairs in the {111} direction of the R-phase VO(2) that are due to the phonons of the V-V arrays along the same direction in a metallic phase. The existance of a substantial amount of structural disorder on the V-V pairs along the c-axis in both M(1) and R phases indicates the structural instability of V-V arrays in the axis. The anomalous structural disorder that was observed on all atomic sites at the structural phase transition prevents the migration of the V 3d(1) electrons, resulting in a Mott insulator in the M(2)-phase VO(2). Nature Publishing Group UK 2017-11-01 /pmc/articles/PMC5666023/ /pubmed/29093503 http://dx.doi.org/10.1038/s41598-017-14235-w Text en © The Author(s) 2017 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Hwang, In-Hui Jin, Zhenlan Park, Chang-In Han, Sang-Wook The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) |
title | The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) |
title_full | The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) |
title_fullStr | The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) |
title_full_unstemmed | The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) |
title_short | The influence of structural disorder and phonon on metal-to-insulator transition of VO(2) |
title_sort | influence of structural disorder and phonon on metal-to-insulator transition of vo(2) |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666023/ https://www.ncbi.nlm.nih.gov/pubmed/29093503 http://dx.doi.org/10.1038/s41598-017-14235-w |
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