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The influence of structural disorder and phonon on metal-to-insulator transition of VO(2)

We used temperature-dependent x-ray absorption fine structure (XAFS) measurements to examine the local structural properties around vanadium atoms at the V K edge from VO(2) films. A direct comparison of the simultaneously-measured resistance and XAFS regarding the VO(2) films showed that the therma...

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Detalles Bibliográficos
Autores principales:	Hwang, In-Hui, Jin, Zhenlan, Park, Chang-In, Han, Sang-Wook
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group UK 2017
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666023/ https://www.ncbi.nlm.nih.gov/pubmed/29093503 http://dx.doi.org/10.1038/s41598-017-14235-w

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