Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography

The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examin...

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Detalles Bibliográficos
Autores principales: Cummins, Cian, Bell, Alan P., Morris, Michael A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666469/
https://www.ncbi.nlm.nih.gov/pubmed/28973987
http://dx.doi.org/10.3390/nano7100304

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5666469/
https://www.ncbi.nlm.nih.gov/pubmed/28973987
http://dx.doi.org/10.3390/nano7100304

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