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Application of CMOS Technology to Silicon Photomultiplier Sensors
We use the 180 nm GLOBALFOUNDRIES (GF) BCDLite CMOS process for the production of a silicon photomultiplier prototype. We study the main characteristics of the developed sensor in comparison with commercial SiPMs obtained in custom technologies and other SiPMs developed with CMOS-compatible processe...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5677208/ https://www.ncbi.nlm.nih.gov/pubmed/28946675 http://dx.doi.org/10.3390/s17102204 |
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author | D’Ascenzo, Nicola Zhang, Xi Xie, Qingguo |
author_facet | D’Ascenzo, Nicola Zhang, Xi Xie, Qingguo |
author_sort | D’Ascenzo, Nicola |
collection | PubMed |
description | We use the 180 nm GLOBALFOUNDRIES (GF) BCDLite CMOS process for the production of a silicon photomultiplier prototype. We study the main characteristics of the developed sensor in comparison with commercial SiPMs obtained in custom technologies and other SiPMs developed with CMOS-compatible processes. We support our discussion with a transient modeling of the detection process of the silicon photomultiplier as well as with a series of static and dynamic experimental measurements in dark and illuminated environments. |
format | Online Article Text |
id | pubmed-5677208 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-56772082017-11-17 Application of CMOS Technology to Silicon Photomultiplier Sensors D’Ascenzo, Nicola Zhang, Xi Xie, Qingguo Sensors (Basel) Article We use the 180 nm GLOBALFOUNDRIES (GF) BCDLite CMOS process for the production of a silicon photomultiplier prototype. We study the main characteristics of the developed sensor in comparison with commercial SiPMs obtained in custom technologies and other SiPMs developed with CMOS-compatible processes. We support our discussion with a transient modeling of the detection process of the silicon photomultiplier as well as with a series of static and dynamic experimental measurements in dark and illuminated environments. MDPI 2017-09-25 /pmc/articles/PMC5677208/ /pubmed/28946675 http://dx.doi.org/10.3390/s17102204 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article D’Ascenzo, Nicola Zhang, Xi Xie, Qingguo Application of CMOS Technology to Silicon Photomultiplier Sensors |
title | Application of CMOS Technology to Silicon Photomultiplier Sensors |
title_full | Application of CMOS Technology to Silicon Photomultiplier Sensors |
title_fullStr | Application of CMOS Technology to Silicon Photomultiplier Sensors |
title_full_unstemmed | Application of CMOS Technology to Silicon Photomultiplier Sensors |
title_short | Application of CMOS Technology to Silicon Photomultiplier Sensors |
title_sort | application of cmos technology to silicon photomultiplier sensors |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5677208/ https://www.ncbi.nlm.nih.gov/pubmed/28946675 http://dx.doi.org/10.3390/s17102204 |
work_keys_str_mv | AT dascenzonicola applicationofcmostechnologytosiliconphotomultipliersensors AT zhangxi applicationofcmostechnologytosiliconphotomultipliersensors AT xieqingguo applicationofcmostechnologytosiliconphotomultipliersensors |