Disordered Nanohole Patterns in Metal-Insulator Multilayer for Ultra-broadband Light Absorption: Atomic Layer Deposition for Lithography Free Highly repeatable Large Scale Multilayer Growth

In this paper, we demonstrate a facile, lithography free, and large scale compatible fabrication route to synthesize an ultra-broadband wide angle perfect absorber based on metal-insulator-metal-insulator (MIMI) stack design. We first conduct a simulation and theoretical modeling approach to study t...

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Detalles Bibliográficos
Autores principales: Ghobadi, Amir, Hajian, Hodjat, Dereshgi, Sina Abedini, Bozok, Berkay, Butun, Bayram, Ozbay, Ekmel
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5678139/
https://www.ncbi.nlm.nih.gov/pubmed/29118435
http://dx.doi.org/10.1038/s41598-017-15312-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5678139/
https://www.ncbi.nlm.nih.gov/pubmed/29118435
http://dx.doi.org/10.1038/s41598-017-15312-w

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