Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology

A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectivel...

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Detalles Bibliográficos
Autores principales: Chaudhary, Prachi, Chhokar, Vinod, Choudhary, Pragati, Kumar, Anil, Beniwal, Vikas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Berlin Heidelberg 2017
Materias:
Original Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5686038/
https://www.ncbi.nlm.nih.gov/pubmed/29138995
http://dx.doi.org/10.1186/s13568-017-0504-0

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5686038/
https://www.ncbi.nlm.nih.gov/pubmed/29138995
http://dx.doi.org/10.1186/s13568-017-0504-0

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