Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology

A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectivel...

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Autores principales: Chaudhary, Prachi, Chhokar, Vinod, Choudhary, Pragati, Kumar, Anil, Beniwal, Vikas
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Berlin Heidelberg 2017
Materias:
Original Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5686038/
https://www.ncbi.nlm.nih.gov/pubmed/29138995
http://dx.doi.org/10.1186/s13568-017-0504-0
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author Chaudhary, Prachi
Chhokar, Vinod
Choudhary, Pragati
Kumar, Anil
Beniwal, Vikas
author_facet Chaudhary, Prachi
Chhokar, Vinod
Choudhary, Pragati
Kumar, Anil
Beniwal, Vikas
author_sort Chaudhary, Prachi
collection PubMed
description A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett–Burman design followed by response surface methodology (RSM). The maximum chromium removal and tannic acid degradation was found to be 92 and 68% respectively by A. niveus. Chromium removal and tannic acid degradation was increased up to 11 and 6% respectively after optimization. Scanning electron microscopy (SEM) and Fourier transform infrared spectroscopy (FTIR) was used to investigate biosorption phenomena. ELECTRONIC SUPPLEMENTARY MATERIAL: The online version of this article (10.1186/s13568-017-0504-0) contains supplementary material, which is available to authorized users.
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spelling pubmed-56860382017-12-01 Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology Chaudhary, Prachi Chhokar, Vinod Choudhary, Pragati Kumar, Anil Beniwal, Vikas AMB Express Original Article A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett–Burman design followed by response surface methodology (RSM). The maximum chromium removal and tannic acid degradation was found to be 92 and 68% respectively by A. niveus. Chromium removal and tannic acid degradation was increased up to 11 and 6% respectively after optimization. Scanning electron microscopy (SEM) and Fourier transform infrared spectroscopy (FTIR) was used to investigate biosorption phenomena. ELECTRONIC SUPPLEMENTARY MATERIAL: The online version of this article (10.1186/s13568-017-0504-0) contains supplementary material, which is available to authorized users. Springer Berlin Heidelberg 2017-11-14 /pmc/articles/PMC5686038/ /pubmed/29138995 http://dx.doi.org/10.1186/s13568-017-0504-0 Text en © The Author(s) 2017 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
spellingShingle Original Article
Chaudhary, Prachi
Chhokar, Vinod
Choudhary, Pragati
Kumar, Anil
Beniwal, Vikas
Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
title Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
title_full Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
title_fullStr Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
title_full_unstemmed Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
title_short Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
title_sort optimization of chromium and tannic acid bioremediation by aspergillus niveus using plackett–burman design and response surface methodology
topic Original Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5686038/
https://www.ncbi.nlm.nih.gov/pubmed/29138995
http://dx.doi.org/10.1186/s13568-017-0504-0
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