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Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett–Burman design and response surface methodology
A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectivel...
Autores principales: | Chaudhary, Prachi, Chhokar, Vinod, Choudhary, Pragati, Kumar, Anil, Beniwal, Vikas |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer Berlin Heidelberg
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5686038/ https://www.ncbi.nlm.nih.gov/pubmed/29138995 http://dx.doi.org/10.1186/s13568-017-0504-0 |
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