Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds and we compare t...

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Detalles Bibliográficos
Autores principales: P, Ragesh Kumar T, Hari, Sangeetha, Damodaran, Krishna K, Ingólfsson, Oddur, Hagen, Cornelis W
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2017
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5687010/
https://www.ncbi.nlm.nih.gov/pubmed/29181294
http://dx.doi.org/10.3762/bjnano.8.237

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5687010/
https://www.ncbi.nlm.nih.gov/pubmed/29181294
http://dx.doi.org/10.3762/bjnano.8.237

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