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Resistive Switching of Sub-10 nm TiO(2) Nanoparticle Self-Assembled Monolayers

Resistively switching devices are promising candidates for the next generation of non-volatile data memories. Such devices are up to now fabricated mainly by means of top-down approaches that apply thin films sandwiched between electrodes. Recent works have demonstrated that resistive switching (RS)...

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Detalles Bibliográficos
Autores principales: Schmidt, Dirk Oliver, Raab, Nicolas, Noyong, Michael, Santhanam, Venugopal, Dittmann, Regina, Simon, Ulrich
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5707587/
https://www.ncbi.nlm.nih.gov/pubmed/29113050
http://dx.doi.org/10.3390/nano7110370
Descripción
Sumario:Resistively switching devices are promising candidates for the next generation of non-volatile data memories. Such devices are up to now fabricated mainly by means of top-down approaches that apply thin films sandwiched between electrodes. Recent works have demonstrated that resistive switching (RS) is also feasible on chemically synthesized nanoparticles (NPs) in the 50 nm range. Following this concept, we developed this approach further to the sub-10 nm range. In this work, we report RS of sub-10 nm TiO(2) NPs that were self-assembled into monolayers and transferred onto metallic substrates. We electrically characterized these monolayers in regard to their RS properties by means of a nanorobotics system in a scanning electron microscope, and found features typical of bipolar resistive switching.