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Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method
Bipolar resistive switching properties and endurance switching behavior of the neodymium oxide (Nd(2)O(3)) thin films resistive random access memory (RRAM) devices for a high resistive status/low resistive status (HRS/LRS) using a low temperature supercritical carbon dioxide fluid (SCF) improvement...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5744350/ https://www.ncbi.nlm.nih.gov/pubmed/29231867 http://dx.doi.org/10.3390/ma10121415 |
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author | Chen, Kai-Huang Kao, Ming-Cheng Huang, Shou-Jen Li, Jian-Zhi |
author_facet | Chen, Kai-Huang Kao, Ming-Cheng Huang, Shou-Jen Li, Jian-Zhi |
author_sort | Chen, Kai-Huang |
collection | PubMed |
description | Bipolar resistive switching properties and endurance switching behavior of the neodymium oxide (Nd(2)O(3)) thin films resistive random access memory (RRAM) devices for a high resistive status/low resistive status (HRS/LRS) using a low temperature supercritical carbon dioxide fluid (SCF) improvement post-treatment process were investigated. Electrical and physical properties improvement of Nd(2)O(3) thin films were measured by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and current versus voltage (I-V) measurement. The metal-like behavior of ohmic conduction mechanism and metallic cluster reaction of hopping conduction mechanism in initial metallic filament path forming process of the SCF-treated thin films RRAM devices was assumed and discussed. Finally, the electrical conduction mechanism of the thin films RRAM derives for set/reset was also discussed and verified in filament path physical model. |
format | Online Article Text |
id | pubmed-5744350 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-57443502017-12-31 Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method Chen, Kai-Huang Kao, Ming-Cheng Huang, Shou-Jen Li, Jian-Zhi Materials (Basel) Article Bipolar resistive switching properties and endurance switching behavior of the neodymium oxide (Nd(2)O(3)) thin films resistive random access memory (RRAM) devices for a high resistive status/low resistive status (HRS/LRS) using a low temperature supercritical carbon dioxide fluid (SCF) improvement post-treatment process were investigated. Electrical and physical properties improvement of Nd(2)O(3) thin films were measured by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and current versus voltage (I-V) measurement. The metal-like behavior of ohmic conduction mechanism and metallic cluster reaction of hopping conduction mechanism in initial metallic filament path forming process of the SCF-treated thin films RRAM devices was assumed and discussed. Finally, the electrical conduction mechanism of the thin films RRAM derives for set/reset was also discussed and verified in filament path physical model. MDPI 2017-12-12 /pmc/articles/PMC5744350/ /pubmed/29231867 http://dx.doi.org/10.3390/ma10121415 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Chen, Kai-Huang Kao, Ming-Cheng Huang, Shou-Jen Li, Jian-Zhi Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method |
title | Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method |
title_full | Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method |
title_fullStr | Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method |
title_full_unstemmed | Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method |
title_short | Bipolar Switching Properties of Neodymium Oxide RRAM Devices Using by a Low Temperature Improvement Method |
title_sort | bipolar switching properties of neodymium oxide rram devices using by a low temperature improvement method |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5744350/ https://www.ncbi.nlm.nih.gov/pubmed/29231867 http://dx.doi.org/10.3390/ma10121415 |
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