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Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography
[Image: see text] High-resolution lithography often involves thin resist layers which pose a challenge for pattern characterization. Direct evidence that the pattern was well-defined and can be used for device fabrication is provided if a successful pattern transfer is demonstrated. In the case of t...
| Autores principales: | , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
American
Chemical Society
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5746844/ https://www.ncbi.nlm.nih.gov/pubmed/29083870 http://dx.doi.org/10.1021/acsnano.7b06307 |