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Effect of Oxygen Sputter Pressure on the Structural, Morphological and Optical Properties of ZnO Thin Films for Gas Sensing Application

ZnO thin films were prepared on glass substrates at low (5 × 10(−4) mbar) and high (3 × 10(−3) mbar) sputter pressure using dc reactive magnetron sputtering. The structural, morphological, compositional and optical properties of the thin films were investigated. XRD patterns of both films confirmed...

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Detalles Bibliográficos
Autores principales: Fairose, S., Ernest, Suhashini, Daniel, Samson
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5747580/
https://www.ncbi.nlm.nih.gov/pubmed/29354023
http://dx.doi.org/10.1007/s11220-017-0184-5