Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Background: Focused electron beam induced deposition (FEBID) allows for the deposition of free standing material within nanometre sizes. The improvement of the technique needs a combination of new precursors and optimized irradiation strategies to achieve a controlled fragmentation of the precursor...

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Detalles Bibliográficos
Autores principales: Sala, Leo, Szymańska, Iwona B, Dablemont, Céline, Lafosse, Anne, Amiaud, Lionel
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2018
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5769079/
https://www.ncbi.nlm.nih.gov/pubmed/29379701
http://dx.doi.org/10.3762/bjnano.9.8

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5769079/
https://www.ncbi.nlm.nih.gov/pubmed/29379701
http://dx.doi.org/10.3762/bjnano.9.8

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