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Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3)
Comprehensive crystal structural study is performed for BiFeO(3) (BFO) film grown on KTaO(3) (KTO) substrate using transmission electron microscopy (TEM) and x-ray diffraction (XRD). Nano-beam electron diffraction (NBED) combined with structure factor calculation and high resolution TEM images clear...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5772049/ https://www.ncbi.nlm.nih.gov/pubmed/29343784 http://dx.doi.org/10.1038/s41598-018-19487-8 |
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author | Bae, In-Tae Ichinose, Tomohiro Han, Myung-Geun Zhu, Yimei Yasui, Shintaro Naganuma, Hiroshi |
author_facet | Bae, In-Tae Ichinose, Tomohiro Han, Myung-Geun Zhu, Yimei Yasui, Shintaro Naganuma, Hiroshi |
author_sort | Bae, In-Tae |
collection | PubMed |
description | Comprehensive crystal structural study is performed for BiFeO(3) (BFO) film grown on KTaO(3) (KTO) substrate using transmission electron microscopy (TEM) and x-ray diffraction (XRD). Nano-beam electron diffraction (NBED) combined with structure factor calculation and high resolution TEM images clearly reveal that the crystal structure within BFO thin film is rhombohedral BFO, i.e., bulk BFO phase. Epitaxial relationship found by NBED indicates the BFO film grows in a manner that minimizes lattice mismatch with KTO. It further suggests BFO film is under slight biaxial tensile stress (~0.35%) along in-plane direction. XRD reveals BFO lattice is under compressive stress (~1.6%), along out-of-plane direction as a result of the biaxial tensile strain applied along in-plane direction. This leads to Poisson’s ratio of ~0.68. In addition, we demonstrate (1) why hexagonal notation rather than pseudocubic one is required for accurate BFO phase evaluation and (2) a new XRD method that shows how rhombohedral BFO can readily be identified among other phases by measuring a rhombohedral specific Bragg’s reflection. |
format | Online Article Text |
id | pubmed-5772049 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-57720492018-01-26 Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) Bae, In-Tae Ichinose, Tomohiro Han, Myung-Geun Zhu, Yimei Yasui, Shintaro Naganuma, Hiroshi Sci Rep Article Comprehensive crystal structural study is performed for BiFeO(3) (BFO) film grown on KTaO(3) (KTO) substrate using transmission electron microscopy (TEM) and x-ray diffraction (XRD). Nano-beam electron diffraction (NBED) combined with structure factor calculation and high resolution TEM images clearly reveal that the crystal structure within BFO thin film is rhombohedral BFO, i.e., bulk BFO phase. Epitaxial relationship found by NBED indicates the BFO film grows in a manner that minimizes lattice mismatch with KTO. It further suggests BFO film is under slight biaxial tensile stress (~0.35%) along in-plane direction. XRD reveals BFO lattice is under compressive stress (~1.6%), along out-of-plane direction as a result of the biaxial tensile strain applied along in-plane direction. This leads to Poisson’s ratio of ~0.68. In addition, we demonstrate (1) why hexagonal notation rather than pseudocubic one is required for accurate BFO phase evaluation and (2) a new XRD method that shows how rhombohedral BFO can readily be identified among other phases by measuring a rhombohedral specific Bragg’s reflection. Nature Publishing Group UK 2018-01-17 /pmc/articles/PMC5772049/ /pubmed/29343784 http://dx.doi.org/10.1038/s41598-018-19487-8 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Bae, In-Tae Ichinose, Tomohiro Han, Myung-Geun Zhu, Yimei Yasui, Shintaro Naganuma, Hiroshi Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) |
title | Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) |
title_full | Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) |
title_fullStr | Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) |
title_full_unstemmed | Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) |
title_short | Tensile stress effect on epitaxial BiFeO(3) thin film grown on KTaO(3) |
title_sort | tensile stress effect on epitaxial bifeo(3) thin film grown on ktao(3) |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5772049/ https://www.ncbi.nlm.nih.gov/pubmed/29343784 http://dx.doi.org/10.1038/s41598-018-19487-8 |
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