Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films

We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a...

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Autores principales: Katsube, Daiki, Yamashita, Hayato, Abo, Satoshi, Abe, Masayuki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2018
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5827635/
https://www.ncbi.nlm.nih.gov/pubmed/29527442
http://dx.doi.org/10.3762/bjnano.9.63
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author Katsube, Daiki
Yamashita, Hayato
Abo, Satoshi
Abe, Masayuki
author_facet Katsube, Daiki
Yamashita, Hayato
Abo, Satoshi
Abe, Masayuki
author_sort Katsube, Daiki
collection PubMed
description We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are not required. The performance of the combined system is demonstrated for the preparation and high-resolution NC-AFM imaging of atomically flat thin films of anatase TiO(2)(001) and LaAlO(3)(100).
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spelling pubmed-58276352018-03-09 Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films Katsube, Daiki Yamashita, Hayato Abo, Satoshi Abe, Masayuki Beilstein J Nanotechnol Full Research Paper We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are not required. The performance of the combined system is demonstrated for the preparation and high-resolution NC-AFM imaging of atomically flat thin films of anatase TiO(2)(001) and LaAlO(3)(100). Beilstein-Institut 2018-02-21 /pmc/articles/PMC5827635/ /pubmed/29527442 http://dx.doi.org/10.3762/bjnano.9.63 Text en Copyright © 2018, Katsube et al. https://creativecommons.org/licenses/by/4.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)
spellingShingle Full Research Paper
Katsube, Daiki
Yamashita, Hayato
Abo, Satoshi
Abe, Masayuki
Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
title Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
title_full Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
title_fullStr Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
title_full_unstemmed Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
title_short Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
title_sort combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films
topic Full Research Paper
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5827635/
https://www.ncbi.nlm.nih.gov/pubmed/29527442
http://dx.doi.org/10.3762/bjnano.9.63
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