Study on the optimization of the deposition rate of planetary GaN-MOCVD films based on CFD simulation and the corresponding surface model

Metal-organic chemical vapour deposition (MOCVD) is a key technique for fabricating GaN thin film structures for light-emitting and semiconductor laser diodes. Film uniformity is an important index to measure equipment performance and chip processes. This paper introduces a method to improve the qua...

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Detalles Bibliográficos
Autores principales: Li, Jian, Fei, Ze-yuan, Xu, Yi-feng, Wang, Jie, Fan, Bing-feng, Ma, Xue-jin, Wang, Gang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society Publishing 2018
Materias:
Engineering
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5830772/
https://www.ncbi.nlm.nih.gov/pubmed/29515883
http://dx.doi.org/10.1098/rsos.171757

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5830772/
https://www.ncbi.nlm.nih.gov/pubmed/29515883
http://dx.doi.org/10.1098/rsos.171757

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