Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography

[Image: see text] The maximum conductivity achievable in Al-doped ZnO thin films prepared by atomic layer deposition (ALD) is limited by the low doping efficiency of Al. To better understand the limiting factors for the doping efficiency, the three-dimensional distribution of Al atoms in the ZnO hos...

Descripción completa

Detalles Bibliográficos
Autores principales: Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A., Macco, Bart, Prosa, Ty J., Larson, David J., Roozeboom, Fred, Kessels, Wilhelmus M. M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2018
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5833938/
https://www.ncbi.nlm.nih.gov/pubmed/29515290
http://dx.doi.org/10.1021/acs.chemmater.7b03501

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5833938/
https://www.ncbi.nlm.nih.gov/pubmed/29515290
http://dx.doi.org/10.1021/acs.chemmater.7b03501

Ejemplares similares