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Effect of annealing treatments on CeO(2) grown on TiN and Si substrates by atomic layer deposition
In this work, we investigate the effect of thermal treatment on CeO(2) films fabricated by using atomic layer deposition (ALD) on titanium nitride (TiN) or on silicon (Si) substrates. In particular, we report on the structural, chemical and morphological properties of 25 nm thick ceria oxide with pa...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5870165/ https://www.ncbi.nlm.nih.gov/pubmed/29600150 http://dx.doi.org/10.3762/bjnano.9.83 |