Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

Topographic nanomanufacturing with a depth precision down to atomic dimension is of importance for advancement of nanoelectronics with new functionalities. Here we demonstrate a mask-less and chemical-free nanolithography process for regio-specific removal of atomic layers on a single crystalline si...

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Detalles Bibliográficos
Autores principales: Chen, Lei, Wen, Jialin, Zhang, Peng, Yu, Bingjun, Chen, Cheng, Ma, Tianbao, Lu, Xinchun, Kim, Seong H., Qian, Linmao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5906689/
https://www.ncbi.nlm.nih.gov/pubmed/29670215
http://dx.doi.org/10.1038/s41467-018-03930-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5906689/
https://www.ncbi.nlm.nih.gov/pubmed/29670215
http://dx.doi.org/10.1038/s41467-018-03930-5

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