Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers

We assessed the exposure of semiconductor workers to extremely low frequency-magnetic fields (ELF-MF) and identified job characteristics affecting ELF-MF exposure. These were demonstrated by assessing the exposure of 117 workers involved in wafer fabrication (fab) and chip packaging wearing personal...

Descripción completa

Detalles Bibliográficos
Autores principales: Choi, Sangjun, Cha, Wonseok, Park, Jihoon, Kim, Seungwon, Kim, Won, Yoon, Chungsik, Park, Ju-Hyun, Ha, Kwonchul, Park, Donguk
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5923684/
https://www.ncbi.nlm.nih.gov/pubmed/29614730
http://dx.doi.org/10.3390/ijerph15040642

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5923684/
https://www.ncbi.nlm.nih.gov/pubmed/29614730
http://dx.doi.org/10.3390/ijerph15040642

Ejemplares similares