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Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate
Boron-containing materials are increasingly drawing interest for the use in electronics, optics, laser targets, neutron absorbers, and high-temperature and chemically resistant ceramics. In this article, the first investigation into the deposition of boron-based material via electron beam-induced de...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5942371/ https://www.ncbi.nlm.nih.gov/pubmed/29765806 http://dx.doi.org/10.3762/bjnano.9.120 |