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Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors

Environmental and thermal stability of two-dimensional (2D) transition metal dichalcogenides (TMDs) remains a fundamental challenge towards enabling robust electronic devices. Few-layer 2H-MoTe(2) with an amorphous boron nitride (a-BN) covering layer was synthesized as a channel for back-gated field...

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Autores principales: Sirota, Benjamin, Glavin, Nicholas, Krylyuk, Sergiy, Davydov, Albert V., Voevodin, Andrey A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5989207/
https://www.ncbi.nlm.nih.gov/pubmed/29875367
http://dx.doi.org/10.1038/s41598-018-26751-4
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author Sirota, Benjamin
Glavin, Nicholas
Krylyuk, Sergiy
Davydov, Albert V.
Voevodin, Andrey A.
author_facet Sirota, Benjamin
Glavin, Nicholas
Krylyuk, Sergiy
Davydov, Albert V.
Voevodin, Andrey A.
author_sort Sirota, Benjamin
collection PubMed
description Environmental and thermal stability of two-dimensional (2D) transition metal dichalcogenides (TMDs) remains a fundamental challenge towards enabling robust electronic devices. Few-layer 2H-MoTe(2) with an amorphous boron nitride (a-BN) covering layer was synthesized as a channel for back-gated field effect transistors (FET) and compared to uncovered MoTe(2). A systematic approach was taken to understand the effects of heat treatment in air on the performance of FET devices. Atmospheric oxygen was shown to negatively affect uncoated MoTe(2) devices while BN-covered FETs showed considerably enhanced chemical and electronic characteristic stability. Uncapped MoTe(2) FET devices, which were heated in air for one minute, showed a polarity switch from n- to p-type at 150 °C, while BN-MoTe(2) devices switched only after 200 °C of heat treatment. Time-dependent experiments at 100 °C showed that uncapped MoTe(2) samples exhibited the polarity switch after 15 min of heat treatment while the BN-capped device maintained its n-type conductivity for the maximum 60 min duration of the experiment. X-ray photoelectron spectroscopy (XPS) analysis suggests that oxygen incorporation into MoTe(2) was the primary doping mechanism for the polarity switch. This work demonstrates the effectiveness of an a-BN capping layer in preserving few-layer MoTe(2) material quality and controlling its conductivity type at elevated temperatures in an atmospheric environment.
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spelling pubmed-59892072018-06-20 Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors Sirota, Benjamin Glavin, Nicholas Krylyuk, Sergiy Davydov, Albert V. Voevodin, Andrey A. Sci Rep Article Environmental and thermal stability of two-dimensional (2D) transition metal dichalcogenides (TMDs) remains a fundamental challenge towards enabling robust electronic devices. Few-layer 2H-MoTe(2) with an amorphous boron nitride (a-BN) covering layer was synthesized as a channel for back-gated field effect transistors (FET) and compared to uncovered MoTe(2). A systematic approach was taken to understand the effects of heat treatment in air on the performance of FET devices. Atmospheric oxygen was shown to negatively affect uncoated MoTe(2) devices while BN-covered FETs showed considerably enhanced chemical and electronic characteristic stability. Uncapped MoTe(2) FET devices, which were heated in air for one minute, showed a polarity switch from n- to p-type at 150 °C, while BN-MoTe(2) devices switched only after 200 °C of heat treatment. Time-dependent experiments at 100 °C showed that uncapped MoTe(2) samples exhibited the polarity switch after 15 min of heat treatment while the BN-capped device maintained its n-type conductivity for the maximum 60 min duration of the experiment. X-ray photoelectron spectroscopy (XPS) analysis suggests that oxygen incorporation into MoTe(2) was the primary doping mechanism for the polarity switch. This work demonstrates the effectiveness of an a-BN capping layer in preserving few-layer MoTe(2) material quality and controlling its conductivity type at elevated temperatures in an atmospheric environment. Nature Publishing Group UK 2018-06-06 /pmc/articles/PMC5989207/ /pubmed/29875367 http://dx.doi.org/10.1038/s41598-018-26751-4 Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Sirota, Benjamin
Glavin, Nicholas
Krylyuk, Sergiy
Davydov, Albert V.
Voevodin, Andrey A.
Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors
title Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors
title_full Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors
title_fullStr Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors
title_full_unstemmed Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors
title_short Hexagonal MoTe(2) with Amorphous BN Passivation Layer for Improved Oxidation Resistance and Endurance of 2D Field Effect Transistors
title_sort hexagonal mote(2) with amorphous bn passivation layer for improved oxidation resistance and endurance of 2d field effect transistors
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5989207/
https://www.ncbi.nlm.nih.gov/pubmed/29875367
http://dx.doi.org/10.1038/s41598-018-26751-4
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