Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review

We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, proc...

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Detalles Bibliográficos
Autores principales: Iqbal, Abid, Mohd-Yasin, Faisal
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6022188/
https://www.ncbi.nlm.nih.gov/pubmed/29865261
http://dx.doi.org/10.3390/s18061797

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6022188/
https://www.ncbi.nlm.nih.gov/pubmed/29865261
http://dx.doi.org/10.3390/s18061797

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