Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review

We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, proc...

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Detalles Bibliográficos
Autores principales: Iqbal, Abid, Mohd-Yasin, Faisal
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6022188/
https://www.ncbi.nlm.nih.gov/pubmed/29865261
http://dx.doi.org/10.3390/s18061797
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author Iqbal, Abid
Mohd-Yasin, Faisal
author_facet Iqbal, Abid
Mohd-Yasin, Faisal
author_sort Iqbal, Abid
collection PubMed
description We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, processes and equipment. This review will be a good starting point to catch up with the state-of-the-arts research on the reactive sputtering of AlN (002) thin film, as well as its evolving list of piezoelectric applications such as energy harvesters.
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spelling pubmed-60221882018-07-02 Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review Iqbal, Abid Mohd-Yasin, Faisal Sensors (Basel) Review We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, processes and equipment. This review will be a good starting point to catch up with the state-of-the-arts research on the reactive sputtering of AlN (002) thin film, as well as its evolving list of piezoelectric applications such as energy harvesters. MDPI 2018-06-02 /pmc/articles/PMC6022188/ /pubmed/29865261 http://dx.doi.org/10.3390/s18061797 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Review
Iqbal, Abid
Mohd-Yasin, Faisal
Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
title Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
title_full Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
title_fullStr Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
title_full_unstemmed Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
title_short Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
title_sort reactive sputtering of aluminum nitride (002) thin films for piezoelectric applications: a review
topic Review
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6022188/
https://www.ncbi.nlm.nih.gov/pubmed/29865261
http://dx.doi.org/10.3390/s18061797
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