A Study of Quantum Confinement Effects in Ultrathin NiO Films Performed by Experiment and Theory

Ultrathin NiO films in the thickness range between 1 and 27 nm have been deposited on high-quality quartz substrates by direct magnetron sputtering under a rough vacuum with a base pressure of 2 × 10(−2) mbar. The sputtering target was metallic Ni; however, due to the rough vacuum a precursor materi...

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Detalles Bibliográficos
Autores principales: Garoufalis, Christos S., Barnasas, Alexandros, Stamatelatos, Alkeos, Karoutsos, Vagelis, Grammatikopoulos, Spyridon, Poulopoulos, Panagiotis, Baskoutas, Sotirios
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6025098/
https://www.ncbi.nlm.nih.gov/pubmed/29867065
http://dx.doi.org/10.3390/ma11060949

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6025098/
https://www.ncbi.nlm.nih.gov/pubmed/29867065
http://dx.doi.org/10.3390/ma11060949

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