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A Study of Quantum Confinement Effects in Ultrathin NiO Films Performed by Experiment and Theory

Ultrathin NiO films in the thickness range between 1 and 27 nm have been deposited on high-quality quartz substrates by direct magnetron sputtering under a rough vacuum with a base pressure of 2 × 10(−2) mbar. The sputtering target was metallic Ni; however, due to the rough vacuum a precursor materi...

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Detalles Bibliográficos
Autores principales:	Garoufalis, Christos S., Barnasas, Alexandros, Stamatelatos, Alkeos, Karoutsos, Vagelis, Grammatikopoulos, Spyridon, Poulopoulos, Panagiotis, Baskoutas, Sotirios
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2018
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6025098/ https://www.ncbi.nlm.nih.gov/pubmed/29867065 http://dx.doi.org/10.3390/ma11060949

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