Investigating the Trimethylaluminium/Water ALD Process on Mesoporous Silica by In Situ Gravimetric Monitoring

A low amount of AlO(x) was successfully deposited on an unordered, mesoporous SiO(2) powder using 1–3 ALD (Atomic Layer Deposition) cycles of trimethylaluminium and water. The process was realized in a self-built ALD setup featuring a microbalanceand a fixed particle bed. The reactor temperature was...

Descripción completa

Detalles Bibliográficos
Autores principales: Strempel, Verena E., Knemeyer, Kristian, Naumann d’Alnoncourt, Raoul, Driess, Matthias, Rosowski, Frank
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6027410/
https://www.ncbi.nlm.nih.gov/pubmed/29795021
http://dx.doi.org/10.3390/nano8060365

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6027410/
https://www.ncbi.nlm.nih.gov/pubmed/29795021
http://dx.doi.org/10.3390/nano8060365

Ejemplares similares