Adding chemically selective subtraction to multi-material 3D additive manufacturing

Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradati...

Descripción completa

Detalles Bibliográficos
Autores principales: Gräfe, David, Wickberg, Andreas, Zieger, Markus Michael, Wegener, Martin, Blasco, Eva, Barner-Kowollik, Christopher
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6050325/
https://www.ncbi.nlm.nih.gov/pubmed/30018325
http://dx.doi.org/10.1038/s41467-018-05234-0

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6050325/
https://www.ncbi.nlm.nih.gov/pubmed/30018325
http://dx.doi.org/10.1038/s41467-018-05234-0

Ejemplares similares